Comparison of the Material Quality of Al(x)In(1−x)N (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering

por Sun, Michael, Blasco, Rodrigo, Nwodo, Julian, de la Mata, María, Molina, Sergio I., Ajay, Akhil, Monroy, Eva, Valdueza-Felip, Sirona, Naranjo, Fernando B.
Publicado 2022