Selective etching of silicon nitride over silicon oxide using ClF(3)/H(2) remote plasma

por Lee, Won Oh, Kim, Ki Hyun, Kim, Doo San, Ji, You Jin, Kang, Ji Eun, Tak, Hyun Woo, Park, Jin Woo, Song, Han Dock, Kim, Ki Seok, Cho, Byeong Ok, Kim, Young Lae, Yeom, Geun Young
Publicado 2022