Mechanism of Thermal Atomic Layer Etch of W Metal Using Sequential Oxidation and Chlorination: A First-Principles Study

por Kondati Natarajan, Suresh, Nolan, Michael, Theofanis, Patrick, Mokhtarzadeh, Charles, Clendenning, Scott B.
Publicado 2020

Process integration and future outlook of 2D transistors

por O’Brien, Kevin P., Naylor, Carl H., Dorow, Chelsey, Maxey, Kirby, Penumatcha, Ashish Verma, Vyatskikh, Andrey, Zhong, Ting, Kitamura, Ande, Lee, Sudarat, Rogan, Carly, Mortelmans, Wouter, Kavrik, Mahmut Sami, Steinhardt, Rachel, Buragohain, Pratyush, Dutta, Sourav, Tronic, Tristan, Clendenning, Scott, Fischer, Paul, Putna, Ernisse S., Radosavljevic, Marko, Metz, Matt, Avci, Uygar
Publicado 2023