Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

por Gharachorlou, Amir, Detwiler, Michael D., Gu, Xiang-Kui, Mayr, Lukas, Klötzer, Bernhard, Greeley, Jeffrey, Reifenberger, Ronald G., Delgass, W. Nicholas, Ribeiro, Fabio H., Zemlyanov, Dmitry Y.
Publicado 2015