Mechanism understanding in cryo atomic layer etching of SiO(2) based upon C(4)F(8) physisorption

por Antoun, G., Tillocher, T., Lefaucheux, P., Faguet, J., Maekawa, K., Dussart, R.
Publicado 2021

Author Correction: Mechanism understanding in cryo atomic layer etching of SiO(2) based upon C(4)F(8) physisorption

por Antoun, G., Tillocher, T., Lefaucheux, P., Faguet, J., Maekawa, K., Dussart, R.
Publicado 2022

Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above −50 °C

por Chanson, R., Zhang, L., Naumov, S., Mankelevich, Yu. A., Tillocher, T., Lefaucheux, P., Dussart, R., Gendt, S. De, Marneffe, J.-F. de
Publicado 2018

Study of the $\gamma$ emission from the 31-year isomer of $^{178}Hf$ induced by X-ray irradiation

por Collins, C B, Davanloo, F, Iosif, M C, Dussart, R, Hicks, J M, Karamian, S A, Ur, C A, Popescu, I I, Kirischuk V I, Pouvesle, J M, McDaniel, P, Crist, C E
Publicado 1999