Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH(4) Plasma

por Kim, Ki Seok, Ji, You-Jin, Kim, Ki-Hyun, Kang, Ji-Eun, Ellingboe, Albert Rogers, Yeom, Geun Young
Publicado 2022

Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source

por Kim, Ki Seok, Kim, Ki Hyun, Ji, You Jin, Park, Jin Woo, Shin, Jae Hee, Ellingboe, Albert Rogers, Yeom, Geun Young
Publicado 2017