Reduction of White Spot Defects in CMOS Image Sensors Fabricated Using Epitaxial Silicon Wafer with Proximity Gettering Sinks by CH(2)P Molecular Ion Implantation

por Kadono, Takeshi, Hirose, Ryo, Onaka-Masada, Ayumi, Kobayashi, Koji, Suzuki, Akihiro, Okuyama, Ryosuke, Koga, Yoshihiro, Fukuyama, Atsuhiko, Kurita, Kazunari
Publicado 2022