Novel hexameric tin carboxylate clusters as efficient negative-tone EUV photoresists: high resolution with well-defined patterns under low energy doses

por Wu, Jia-Rong, Lin, Ting-An, Wu, Yan-Ru, Chen, Po-Hsiung, Gau, Tsi-Sheng, Lin, Burn-Jeng, Chiu, Po-Wen, Liu, Rai-Shung
Publicado 2023