Low-temperature fabrication of an HfO(2) passivation layer for amorphous indium–gallium–zinc oxide thin film transistors using a solution process

por Hong, Seonghwan, Park, Sung Pyo, Kim, Yeong-gyu, Kang, Byung Ha, Na, Jae Won, Kim, Hyun Jae
Publicado 2017

The self-activated radical doping effects on the catalyzed surface of amorphous metal oxide films

por Kim, Hong Jae, Tak, Young Jun, Park, Sung Pyo, Na, Jae Won, Kim, Yeong-gyu, Hong, Seonghwan, Kim, Pyeong Hun, Kim, Geon Tae, Kim, Byeong Koo, Kim, Hyun Jae
Publicado 2017