Dry etching of ternary metal carbide TiAlC via surface modification using floating wire-assisted vapor plasma

por Nguyen, Thi-Thuy-Nga, Shinoda, Kazunori, Hamamura, Hirotaka, Maeda, Kenji, Yokogawa, Kenetsu, Izawa, Masaru, Ishikawa, Kenji, Hori, Masaru
Publicado 2022