The chemical states and atomic structure evolution of ultralow-energy high-dose Boron implanted Si(110) via laser annealing

por Lee, Fu-Ying, Wu, Zong-Zhe, Kao, Li-Chi, Chang, Feng-Mei, Chen, Sheng-Wen, JangJian, Shiu-Ko, Cheng, Hui-Yu, Chen, Wei-Liang, Chang, Yu-Ming, Lo, Kuang Yao
Publicado 2017