Investigation into SiO(2) Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled

por Jeong, Won-nyoung, Lee, Young-seok, Cho, Chul-hee, Seong, In-ho, You, Shin-jae
Publicado 2022

Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation

por Kim, Si-jun, Seong, In-ho, Lee, Young-seok, Cho, Chul-hee, Jeong, Won-nyoung, You, Ye-bin, Lee, Jang-jae, You, Shin-jae
Publicado 2022

Influence of Additive N(2) on O(2) Plasma Ashing Process in Inductively Coupled Plasma

por You, Ye-Bin, Lee, Young-Seok, Kim, Si-Jun, Cho, Chul-Hee, Seong, In-Ho, Jeong, Won-Nyoung, Choi, Min-Su, You, Shin-Jae
Publicado 2022

Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Disp...

por Kim, Si-Jun, Choi, Min-Su, Lee, Sang-Ho, Jeong, Won-Nyoung, Lee, Young-Seok, Seong, In-Ho, Cho, Chul-Hee, Kim, Dae-Woong, You, Shin-Jae
Publicado 2023