The Study of Reactive Ion Etching of Heavily Doped Polysilicon Based on HBr/O(2)/He Plasmas for Thermopile Devices

por Zhou, Na, Li, Junjie, Mao, Haiyang, Liu, Hao, Liu, Jinbiao, Gao, Jianfeng, Xiang, Jinjuan, Hu, Yanpeng, Shi, Meng, Ju, Jiaxin, Lei, Yuxiao, Yang, Tao, Li, Junfeng, Wang, Wenwu
Publicado 2020