Development of a 2.45-GHz ECR ion source for ion-implanter application

por Sekiguchi, M, Matsushita, H, Jonoshita, I, Kabasawa, Mitsuaki
Publicado 1997

Microwave surface resistance of plasma-sprayed YBaCuO thick films on large-area metallic substrates

por Ezura, E, Asano, K, Hayano, H, Hosoyama, K, Inagaki, S, Isagawa, S, Kabasawa, Mitsuaki, Kojima, Y, Kosuge, S, Mitsunobu, S, Momose, T, Nakada, K, Nakanishi, H, Shimbo, Y, Shishido, T, Tachikawa, K, Takahashi, T, Yoshihara, K
Publicado 1993

Injector Design For The 8-gev Synchrotron Radiation Facility in Japan

por Harami, T, Yokomizo, H, Ohtsuka, H, Shimada, T, Yanagida, K, Mashiko, K, Yoshikawa, H, Suzuki, H, Kabasawa, Mitsuaki, Nakayama, K, Hashimoto, H, Ashida, K, Ishida, T, Yamada, K, Iizuka, M, Harada, S, Suzuki, Y, Kamitsubo, H
Publicado 1990