Selective Etching of Si versus Si(1−x)Ge(x) in Tetramethyl Ammonium Hydroxide Solutions with Surfactant

por Choi, Yongjoon, Cho, Choonghee, Yoon, Dongmin, Kang, Joosung, Kim, Jihye, Kim, So Young, Suh, Dong Chan, Ko, Dae-Hong
Publicado 2022