From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity†

por Mackus, Adriaan J. M., Merkx, Marc J. M., Kessels, Wilhelmus M. M.
Publicado 2018

Atomic Layer Deposition of Al-Doped MoS(2): Synthesizing a p-type 2D Semiconductor with Tunable Carrier Density

por Vandalon, Vincent, Verheijen, Marcel A., Kessels, Wilhelmus M. M., Bol, Ageeth A.
Publicado 2020

ALD-grown two-dimensional TiS(x) metal contacts for MoS(2) field-effect transistors

por Mahlouji, Reyhaneh, Kessels, Wilhelmus M. M. (Erwin), Sagade, Abhay A., Bol, Ageeth A.
Publicado 2023

Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO(2) and TiO(2)

por Arts, Karsten, Deijkers, Sanne, Puurunen, Riikka L., Kessels, Wilhelmus M. M., Knoops, Harm C. M.
Publicado 2021

Conformal Growth of Nanometer-Thick Transition Metal Dichalcogenide TiS(x)-NbS(x) Heterostructures over 3D Substrates by Atomic Layer Deposition: Implications for Device Fabricatio...

por Basuvalingam, Saravana Balaji, Bloodgood, Matthew A., Verheijen, Marcel A., Kessels, Wilhelmus M. M., Bol, Ageeth A.
Publicado 2021

Reaction Mechanisms during Atomic Layer Deposition of AlF(3) Using Al(CH(3))(3) and SF(6) Plasma

por Vos, Martijn F. J., Knoops, Harm C. M., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M.
Publicado 2021

Chemical Analysis of the Interface between Hybrid Organic–Inorganic Perovskite and Atomic Layer Deposited Al(2)O(3)

por Koushik, Dibyashree, Hazendonk, Lotte, Zardetto, Valerio, Vandalon, Vincent, Verheijen, Marcel A., Kessels, Wilhelmus M.M., Creatore, Mariadriana
Publicado 2019

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO(2)

por Arts, Karsten, Thepass, Harvey, Verheijen, Marcel A., Puurunen, Riikka L., Kessels, Wilhelmus M. M., Knoops, Harm C. M.
Publicado 2021

Area-Selective Atomic Layer Deposition of Two-Dimensional WS(2) Nanolayers

por Balasubramanyam, Shashank, Merkx, Marc J. M., Verheijen, Marcel A., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M., Bol, Ageeth A.
Publicado 2020

On the Contact Optimization of ALD-Based MoS(2) FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance

por Mahlouji, Reyhaneh, Zhang, Yue, Verheijen, Marcel A., Hofmann, Jan P., Kessels, Wilhelmus M. M., Sagade, Abhay A., Bol, Ageeth A.
Publicado 2021

Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS(2) Thin Films at 150 °C

por Mattinen, Miika, Schulpen, Jeff J. P. M., Dawley, Rebecca A., Gity, Farzan, Verheijen, Marcel A., Kessels, Wilhelmus M. M., Bol, Ageeth A.
Publicado 2023

In Situ IR Spectroscopy Studies of Atomic Layer-Deposited SnO(2) on Formamidinium-Based Lead Halide Perovskite

por Bracesco, Andrea E. A., Jansen, Jarvi W. P, Xue, Haibo, Zardetto, Valerio, Brocks, Geert, Kessels, Wilhelmus M. M., Tao, Shuxia, Creatore, Mariadriana
Publicado 2023

Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography

por Wu, Yizhi, Giddings, A. Devin, Verheijen, Marcel A., Macco, Bart, Prosa, Ty J., Larson, David J., Roozeboom, Fred, Kessels, Wilhelmus M. M.
Publicado 2018

Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS(2) Layers

por Balasubramanyam, Shashank, Bloodgood, Matthew A., van Ommeren, Mark, Faraz, Tahsin, Vandalon, Vincent, Kessels, Wilhelmus M. M., Verheijen, Marcel A., Bol, Ageeth A.
Publicado 2019

PO(x)/Al(2)O(3) Stacks for c-Si Surface Passivation: Material and Interface Properties

por Theeuwes, Roel J., Melskens, Jimmy, Black, Lachlan E., Beyer, Wolfhard, Koushik, Dibyashree, Berghuis, Wilhelmus J. H., Macco, Bart, Kessels, Wilhelmus M. M.
Publicado 2021

Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100 °C through Control of Plasma Chemistry

por Mattinen, Miika, Gity, Farzan, Coleman, Emma, Vonk, Joris F. A., Verheijen, Marcel A., Duffy, Ray, Kessels, Wilhelmus M. M., Bol, Ageeth A.
Publicado 2022

Area-Selective Atomic Layer Deposition of In(2)O(3):H Using a μ-Plasma Printer for Local Area Activation

por Mameli, Alfredo, Kuang, Yinghuan, Aghaee, Morteza, Ande, Chaitanya K., Karasulu, Bora, Creatore, Mariadriana, Mackus, Adriaan J. M., Kessels, Wilhelmus M. M., Roozeboom, Fred
Publicado 2017

Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices

por Gerritsen, Sven H., Chittock, Nicholas J., Vandalon, Vincent, Verheijen, Marcel A., Knoops, Harm C. M., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M.
Publicado 2022

Edge-Site Nanoengineering of WS(2) by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution

por Balasubramanyam, Shashank, Shirazi, Mahdi, Bloodgood, Matthew A., Wu, Longfei, Verheijen, Marcel A., Vandalon, Vincent, Kessels, Wilhelmus M. M., Hofmann, Jan P., Bol, Ageeth A.
Publicado 2019

Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation

por Zhang, Ruoyu, van Straaten, Gerben, di Palma, Valerio, Zafeiropoulos, Georgios, van de Sanden, Mauritius C.M., Kessels, Wilhelmus M.M., Tsampas, Mihalis N., Creatore, Mariadriana
Publicado 2021