Selective isotropic etching of SiO(2) over Si(3)N(4) using NF(3)/H(2) remote plasma and methanol vapor

por Gil, Hong Seong, Kim, Doo San, Jang, Yun Jong, Kim, Dea Whan, Kwon, Hea In, Kim, Gyoung Chan, Kim, Dong Woo, Yeom, Geun Young
Publicado 2023