Silicon Oxide Etching Process of NF(3) and F(3)NO Plasmas with a Residual Gas Analyzer

por Kim, Woo-Jae, Bang, In-Young, Kim, Ji-Hwan, Park, Yeon-Soo, Kwon, Hee-Tae, Shin, Gi-Won, Kang, Min-Ho, Cho, Youngjun, Kwon, Byung-Hyang, Kwak, Jung-Hun, Kwon, Gi-Chung
Publicado 2021