Silicon Wafer CMP Slurry Using a Hydrolysis Reaction Accelerator with an Amine Functional Group Remarkably Enhances Polishing Rate

por Bae, Jae-Young, Han, Man-Hyup, Lee, Seung-Jae, Kim, Eun-Seong, Lee, Kyungsik, Lee, Gon-sub, Park, Jin-Hyung, Park, Jea-Gun
Publicado 2022