Thickness scaling of atomic-layer-deposited HfO(2) films and their application to wafer-scale graphene tunnelling transistors

por Jeong, Seong-Jun, Gu, Yeahyun, Heo, Jinseong, Yang, Jaehyun, Lee, Chang-Seok, Lee, Min-Hyun, Lee, Yunseong, Kim, Hyoungsub, Park, Seongjun, Hwang, Sungwoo
Publicado 2016