Prediction of Pad Wear Profile and Simulation of Its Influence on Wafer Polishing

por Zheng, Pengjie, Zhao, Dewen, Lu, Xinchun
Publicado 2023

Endpoint Detection Based on Optical Method in Chemical Mechanical Polishing

por Tian, Fangxin, Wang, Tongqing, Lu, Xinchun
Publicado 2023

Motor Power Signal Analysis for End-Point Detection of Chemical Mechanical Planarization

por Li, Hongkai, Lu, Xinchun, Luo, Jianbin
Publicado 2017

A flexible nanobrush pad for the chemical mechanical planarization of Cu/ultra-low-к materials

por Han, Guiquan, Liu, Yuhong, Lu, Xinchun, Luo, Jianbin
Publicado 2012

An Investigation on the Total Thickness Variation Control and Optimization in the Wafer Backside Grinding Process

por Liu, Yuanhang, Tao, Hongfei, Zhao, Dewen, Lu, Xinchun
Publicado 2022

Evolution of entrained water film thickness and dynamics of Marangoni flow in Marangoni drying

por Li, Changkun, Zhao, Dewen, Wen, Jialin, Cheng, Jie, Lu, Xinchun
Publicado 2018

Keystone Microbiomes Revealed by 14 Years of Field Restoration of the Degraded Agricultural Soil Under Distinct Vegetation Scenarios

por Zhang, Zhiming, Han, Xiaozeng, Yan, Jun, Zou, Wenxiu, Wang, Entao, Lu, Xinchun, Chen, Xu
Publicado 2020

Long-term application of fertilizer and manures affect P fractions in Mollisol

por Lu, Xinchun, Mahdi, Al-Kaisi, Han, Xiao-zeng, Chen, Xu, Yan, Jun, Biswas, Asim, Zou, Wen-xiu
Publicado 2020

Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions

por Chen, Lei, Wen, Jialin, Zhang, Peng, Yu, Bingjun, Chen, Cheng, Ma, Tianbao, Lu, Xinchun, Kim, Seong H., Qian, Linmao
Publicado 2018