Reliable metal–graphene contact formation process flows in a CMOS-compatible environment

por Elviretti, M., Lisker, M., Lukose, R., Lukosius, M., Akhtar, F., Mai, A.
Publicado 2022

Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene

por Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Publicado 2021

Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene

por Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Publicado 2021