Perfluorodecyltrichlorosilane-based seed-layer for improved chemical vapour deposition of ultrathin hafnium dioxide films on graphene

por Kitzmann, Julia, Göritz, Alexander, Fraschke, Mirko, Lukosius, Mindaugas, Wenger, Christian, Wolff, Andre, Lupina, Grzegorz
Publicado 2016

Graphene growth on Ge(100)/Si(100) substrates by CVD method

por Pasternak, Iwona, Wesolowski, Marek, Jozwik, Iwona, Lukosius, Mindaugas, Lupina, Grzegorz, Dabrowski, Pawel, Baranowski, Jacek M., Strupinski, Wlodek
Publicado 2016