Synchrotron-radiation-stimulated etching of polydimethylsiloxane using XeF(2) as a reaction gas

por Chiang, Tsung-Yi, Makimura, Tetsuya, He, Tingchao, Torii, Shuichi, Yoshida, Tomoko, Tero, Ryugo, Wang, Changshun, Urisu, Tsuneo
Publicado 2010