Area-Selective Atomic Layer Deposition of SiO(2) Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

por Mameli, Alfredo, Merkx, Marc J. M., Karasulu, Bora, Roozeboom, Fred, Kessels, Wilhelmus (Erwin) M. M., Mackus, Adriaan J. M.
Publicado 2017

Area-Selective Atomic Layer Deposition of In(2)O(3):H Using a μ-Plasma Printer for Local Area Activation

por Mameli, Alfredo, Kuang, Yinghuan, Aghaee, Morteza, Ande, Chaitanya K., Karasulu, Bora, Creatore, Mariadriana, Mackus, Adriaan J. M., Kessels, Wilhelmus M. M., Roozeboom, Fred
Publicado 2017

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

por Merkx, Marc J. M., Angelidis, Athanasios, Mameli, Alfredo, Li, Jun, Lemaire, Paul C., Sharma, Kashish, Hausmann, Dennis M., Kessels, Wilhelmus M. M., Sandoval, Tania E., Mackus, Adriaan J. M.
Publicado 2022