Near-field sub-diffraction photolithography with an elastomeric photomask

por Paik, Sangyoon, Kim, Gwangmook, Chang, Sehwan, Lee, Sooun, Jin, Dana, Jeong, Kwang-Yong, Lee, I Sak, Lee, Jekwan, Moon, Hongjae, Lee, Jaejun, Chang, Kiseok, Choi, Su Seok, Moon, Jeongmin, Jung, Soonshin, Kang, Shinill, Lee, Wooyoung, Choi, Heon-Jin, Choi, Hyunyong, Kim, Hyun Jae, Lee, Jae-Hyun, Cheon, Jinwoo, Kim, Miso, Myoung, Jaemin, Park, Hong-Gyu, Shim, Wooyoung
Publicado 2020