Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication

por Löfstrand, Anette, Jafari Jam, Reza, Mothander, Karolina, Nylander, Tommy, Mumtaz, Muhammad, Vorobiev, Alexei, Chen, Wen-Chang, Borsali, Redouane, Maximov, Ivan
Publicado 2021