Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH(3) and Selective Deposition on Defects of Graphene

por Kim, Minsu, Nabeya, Shunichi, Nandi, Dip K., Suzuki, Kazuharu, Kim, Hyun-Mi, Cho, Seong-Yong, Kim, Ki-Bum, Kim, Soo-Hyun
Publicado 2019