Direct evidence of flat band voltage shift for TiN/LaO or ZrO/SiO(2) stack structure via work function depth profiling

por Heo, Sung, Park, Hyoungsun, Ko, Dong-Su, Kim, Yong Su, Kyoung, Yong Koo, Lee, Hyung-Ik, Cho, Eunae, Lee, Hyo Sug, Park, Gyung-Su, Shin, Jai Kwang, Lee, Dongjin, Lee, Jieun, Jung, Kyoungho, Jeong, Moonyoung, Yamada, Satoru, Kang, Hee Jae, Choi, Byoung-Deog
Publicado 2017