Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO(2)

por Lee, Youngseok, Kim, Sijun, Lee, Jangjae, Cho, Chulhee, Seong, Inho, You, Shinjae
Publicado 2022

Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method

por Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Seong, Inho, Jeong, Wonnyoung, You, Yebin, Choi, Minsu, You, Shinjae
Publicado 2023

Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath

por Seong, Inho, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Lee, Jangjae, Jeong, Wonnyoung, You, Yebin, You, Shinjae
Publicado 2022

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma

por Seong, Inho, Lee, Jinho, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Lee, Jangjae, Jeong, Wonnyoung, You, Yebin, You, Shinjae
Publicado 2022

On the Quenching of Electron Temperature in Inductively Coupled Plasma

por Seong, Inho, Kim, Si-jun, Lee, Youngseok, Cho, Chulhee, Jeong, Wonnyoung, You, Yebin, Choi, Minsu, Choi, Byeongyeop, You, Shinjae
Publicado 2023

Contribution of Ion Energy and Flux on High-Aspect Ratio SiO(2) Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C(4)F(8) Plasma: Individual Ion Energy and Flux...

por Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae
Publicado 2023

Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma

por Seong, Inho, Kim, Sijun, Choi, Minsu, Lee, Woobeen, Jeong, Wonnyoung, Cho, Chulhee, You, Yebin, Lee, Youngseok, Seol, Youbin, You, Shinjae
Publicado 2023

Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma

por Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Jeong, Wonnyoung, Seong, Inho, Lee, Jangjae, Choi, Minsu, You, Yebin, Lee, Sangho, Lee, Jinho, You, Shinjae
Publicado 2022

Characterization of SiO(2) Plasma Etching with Perfluorocarbon (C(4)F(8) and C(6)F(6)) and Hydrofluorocarbon (CHF(3) and C(4)H(2)F(6)) Precursors for the Greenhouse Gas Emissions R...

por Choi, Minsu, Lee, Youngseok, You, Yebin, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Choi, Byeongyeop, Kim, Sijun, Seol, Youbin, You, Shinjae, Yeom, Geun Young
Publicado 2023