Subband engineering in n-type silicon nanowires using strain and confinement

por Stanojević, Zlatan, Sverdlov, Viktor, Baumgartner, Oskar, Kosina, Hans
Publicado 2012

Effect of Mask Geometry Variation on Plasma Etching Profiles †

por Bobinac, Josip, Reiter, Tobias, Piso, Julius, Klemenschits, Xaver, Baumgartner, Oskar, Stanojevic, Zlatan, Strof, Georg, Karner, Markus, Filipovic, Lado
Publicado 2023