Thick film SOI technology: characteristics of devices and performance of circuits for high-energy physics at cryogenic temperatures

por Fourches, N T, Abbon, P, Chipaux, Rémi, Delagnes, E, Orsier, E, Pailler, P, Du Port de Pontcharra, J, Rouger, M, Sueur, M, Truche, R
Publicado 1997