Vertical and bevel-structured SiC etching techniques incorporating different gas mixture plasmas for various microelectronic applications

por Sung, Ho-Kun, Qiang, Tian, Yao, Zhao, Li, Yang, Wu, Qun, Lee, Hee-Kwan, Park, Bum-Doo, Lim, Woong-Sun, Park, Kyung-Ho, Wang, Cong
Publicado 2017