MOS Capacitance Measurements for PEALD TiO(2) Dielectric Films Grown under Different Conditions and the Impact of Al(2)O(3) Partial-Monolayer Insertion

por Chiappim, William, Watanabe, Marcos, Dias, Vanessa, Testoni, Giorgio, Rangel, Ricardo, Fraga, Mariana, Maciel, Homero, dos Santos Filho, Sebastião, Pessoa, Rodrigo
Publicado 2020

Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO(2)...

por Chiappim, William, Testoni, Giorgio, Miranda, Felipe, Fraga, Mariana, Furlan, Humber, Saravia, David Ardiles, Sobrinho, Argemiro da Silva, Petraconi, Gilberto, Maciel, Homero, Pessoa, Rodrigo
Publicado 2021