Approaching Defect-free Amorphous Silicon Nitride by Plasma-assisted Atomic Beam Deposition for High Performance Gate Dielectric

por Tsai, Shu-Ju, Wang, Chiang-Lun, Lee, Hung-Chun, Lin, Chun-Yeh, Chen, Jhih-Wei, Shiu, Hong-Wei, Chang, Lo-Yueh, Hsueh, Han-Ting, Chen, Hung-Ying, Tsai, Jyun-Yu, Lu, Ying-Hsin, Chang, Ting-Chang, Tu, Li-Wei, Teng, Hsisheng, Chen, Yi-Chun, Chen, Chia-Hao, Wu, Chung-Lin
Publicado 2016