Characteristics of Hf(0.5)Zr(0.5)O(2) Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory

por Hong, Da Hee, Yoo, Jae Hoon, Park, Won Ji, Kim, So Won, Kim, Jong Hwan, Uhm, Sae Hoon, Lee, Hee Chul
Publicado 2023

Preparation of Remote Plasma Atomic Layer-Deposited HfO(2) Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices

por Yoo, Jae-Hoon, Park, Won-Ji, Kim, So-Won, Lee, Ga-Ram, Kim, Jong-Hwan, Lee, Joung-Ho, Uhm, Sae-Hoon, Lee, Hee-Chul
Publicado 2023