Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

por Choi, Chungryong, Park, Jichoel, Vincent Joseph, Kanniyambatti L., Lee, Jaeyong, Ahn, Seonghyeon, Kwak, Jongheon, Lee, Kyu Seong, Kim, Jin Kon
Publicado 2017