Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance

por Thakur, Neha, Vockenhuber, Michaela, Ekinci, Yasin, Watts, Benjamin, Giglia, Angelo, Mahne, Nicola, Nannarone, Stefano, Castellanos, Sonia, Brouwer, Albert M.
Publicado 2022

Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

por Wang, Yake, Chen, Jinping, Zeng, Yi, Yu, Tianjun, Guo, Xudong, Wang, Shuangqing, Allenet, Timothée, Vockenhuber, Michaela, Ekinci, Yasin, Zhao, Jun, Yang, Shumin, Wu, Yanqing, Yang, Guoqiang, Li, Yi
Publicado 2022