Displacement Talbot lithography for nano-engineering of III-nitride materials

por Coulon, Pierre-Marie, Damilano, Benjamin, Alloing, Blandine, Chausse, Pierre, Walde, Sebastian, Enslin, Johannes, Armstrong, Robert, Vézian, Stéphane, Hagedorn, Sylvia, Wernicke, Tim, Massies, Jean, Zúñiga‐Pérez, Jesus, Weyers, Markus, Kneissl, Michael, Shields, Philip A.
Publicado 2019