Suppression of GeO(x) interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semi...

por Wang, Chin-I., Chang, Teng-Jan, Wang, Chun-Yuan, Yin, Yu-Tung, Shyue, Jing-Jong, Lin, Hsin-Chih, Chen, Miin-Jang
Publicado 2019