Scalable lateral heterojunction by chemical doping of 2D TMD thin films

por Chamlagain, Bhim, Withanage, Sajeevi S., Johnston, Ammon C., Khondaker, Saiful I.
Publicado 2020

Uniform Vapor-Pressure-Based Chemical Vapor Deposition Growth of MoS(2) Using MoO(3) Thin Film as a Precursor for Coevaporation

por Withanage, Sajeevi S., Kalita, Hirokjyoti, Chung, Hee-Suk, Roy, Tania, Jung, Yeonwoong, Khondaker, Saiful I.
Publicado 2018