Impact and Origin of Interface States in MOS Capacitor with Monolayer MoS(2) and HfO(2) High-k Dielectric

por Xia, Pengkun, Feng, Xuewei, Ng, Rui Jie, Wang, Shijie, Chi, Dongzhi, Li, Cequn, He, Zhubing, Liu, Xinke, Ang, Kah-Wee
Publicado 2017