Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

por Gan, Zhuofei, Feng, Hongtao, Chen, Liyang, Min, Siyi, Liang, Chuwei, Xu, Menghong, Jiang, Zijie, Sun, Zhao, Sun, Chuying, Cui, Dehu, Li, Wen-Di
Publicado 2022