Voltage distribution over capacitively coupled plasma electrode for atmospheric-pressure plasma generation

por Shuto, Mitsutoshi, Tomino, Fukumi, Ohmi, Hiromasa, Kakiuchi, Hiroaki, Yasutake, Kiyoshi
Publicado 2013

Significant Improvement of Copper Dry Etching Property of a High-Pressure Hydrogen-Based Plasma by Nitrogen Gas Addition

por Ohmi, Hiromasa, Sato, Jumpei, Shirasu, Yoshiki, Hirano, Tatsuya, Kakiuchi, Hiroaki, Yasutake, Kiyoshi
Publicado 2019

Interface properties of SiO(x)N(y) layer on Si prepared by atmospheric-pressure plasma oxidation-nitridation

por Zhuo, Zeteng, Sannomiya, Yuta, Kanetani, Yuki, Yamada, Takahiro, Ohmi, Hiromasa, Kakiuchi, Hiroaki, Yasutake, Kiyoshi
Publicado 2013