AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing

por Kao, Wei-Chung, Lee, Wei-Hao, Yi, Sheng-Han, Shen, Tsung-Han, Lin, Hsin-Chih, Chen, Miin-Jang
Publicado 2019

Sharp Transformation across Morphotropic Phase Boundary in Sub‐6 nm Wake‐Up‐Free Ferroelectric Films by Atomic Layer Technology

por Chuang, Chun‐Ho, Wang, Ting‐Yun, Chou, Chun‐Yi, Yi, Sheng‐Han, Jiang, Yu‐Sen, Shyue, Jing‐Jong, Chen, Miin‐Jang
Publicado 2023