A Simple Method for High-Performance, Solution-Processed, Amorphous ZrO(2) Gate Insulator TFT with a High Concentration Precursor

por Cai, Wei, Zhu, Zhennan, Wei, Jinglin, Fang, Zhiqiang, Ning, Honglong, Zheng, Zeke, Zhou, Shangxiong, Yao, Rihui, Peng, Junbiao, Lu, Xubing
Publicado 2017

Investigation of direct inkjet-printed versus spin-coated ZrO(2) for sputter IGZO thin film transistor

por Cai, Wei, Ning, Honglong, Zhu, Zhennan, Wei, Jinglin, Zhou, Shangxiong, Yao, Rihui, Fang, Zhiqiang, Huang, Xiuqi, Lu, Xubing, Peng, Junbiao
Publicado 2019

Bias Stress Stability of Solution-Processed Nano Indium Oxide Thin Film Transistor

por Yao, Rihui, Fu, Xiao, Li, Wanwan, Zhou, Shangxiong, Ning, Honglong, Tang, Biao, Wei, Jinglin, Cao, Xiuhua, Xu, Wei, Peng, Junbiao
Publicado 2021

Thermal effect of annealing-temperature on solution-processed high-k ZrO(2) dielectrics

por Zhou, Shangxiong, Zhang, Jianhua, Fang, Zhiqiang, Ning, Honglong, Cai, Wei, Zhu, Zhennan, Liang, Zhihao, Yao, Rihui, Guo, Dong, Peng, Junbiao
Publicado 2019