Tuning of Schottky Barrier Height at NiSi/Si Contact by Combining Dual Implantation of Boron and Aluminum and Microwave Annealing

por Sun, Feng, Li, Chen, Fu, Chaochao, Zhou, Xiangbiao, Luo, Jun, Zou, Wei, Qiu, Zhi-Jun, Wu, Dongping
Publicado 2018

Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing

por Fu, Chaochao, Zhou, Xiangbiao, Wang, Yan, Xu, Peng, Xu, Ming, Wu, Dongping, Luo, Jun, Zhao, Chao, Zhang, Shi-Li
Publicado 2016