Interface properties of SiO(x)N(y) layer on Si prepared by atmospheric-pressure plasma oxidation-nitridation

por Zhuo, Zeteng, Sannomiya, Yuta, Kanetani, Yuki, Yamada, Takahiro, Ohmi, Hiromasa, Kakiuchi, Hiroaki, Yasutake, Kiyoshi
Publicado 2013