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Electrical resistivity of thin metal films

The aim of the book is to give an actual survey on the resistivity of thin metal and semiconductor films interacting with gases. We discuss the influence of the substrate material and the annealing treatment of the films, presenting our experimental data as well as theoretical models to calculate th...

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Detalles Bibliográficos
Autores principales: Wissmann, Peter, Finzel, Hans-Ulrich
Lenguaje:eng
Publicado: Springer 2007
Materias:
Acceso en línea:https://dx.doi.org/10.1007/3-540-48490-6
http://cds.cern.ch/record/1012802
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author Wissmann, Peter
Finzel, Hans-Ulrich
author_facet Wissmann, Peter
Finzel, Hans-Ulrich
author_sort Wissmann, Peter
collection CERN
description The aim of the book is to give an actual survey on the resistivity of thin metal and semiconductor films interacting with gases. We discuss the influence of the substrate material and the annealing treatment of the films, presenting our experimental data as well as theoretical models to calculate the scattering cross section of the conduction electrons in the frame-work of the scattering hypothesis. Main emphasis is laid on the comparison of gold and silver films which exhibit nearly the same lattice structure but differ in their chemical activity. In conclusion, the most important quantity for the interpretation is the surface charging z while the correlation with the optical data or the frustrated IR vibrations seems the show a more material-specific character. Z can be calculated on the basis of the density functional formalism or the self-consistent field approximation using Mulliken’s population analysis.
id cern-1012802
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2007
publisher Springer
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spelling cern-10128022021-04-22T02:03:27Zdoi:10.1007/3-540-48490-6http://cds.cern.ch/record/1012802engWissmann, PeterFinzel, Hans-UlrichElectrical resistivity of thin metal filmsEngineeringThe aim of the book is to give an actual survey on the resistivity of thin metal and semiconductor films interacting with gases. We discuss the influence of the substrate material and the annealing treatment of the films, presenting our experimental data as well as theoretical models to calculate the scattering cross section of the conduction electrons in the frame-work of the scattering hypothesis. Main emphasis is laid on the comparison of gold and silver films which exhibit nearly the same lattice structure but differ in their chemical activity. In conclusion, the most important quantity for the interpretation is the surface charging z while the correlation with the optical data or the frustrated IR vibrations seems the show a more material-specific character. Z can be calculated on the basis of the density functional formalism or the self-consistent field approximation using Mulliken’s population analysis.Springeroai:cds.cern.ch:10128022007
spellingShingle Engineering
Wissmann, Peter
Finzel, Hans-Ulrich
Electrical resistivity of thin metal films
title Electrical resistivity of thin metal films
title_full Electrical resistivity of thin metal films
title_fullStr Electrical resistivity of thin metal films
title_full_unstemmed Electrical resistivity of thin metal films
title_short Electrical resistivity of thin metal films
title_sort electrical resistivity of thin metal films
topic Engineering
url https://dx.doi.org/10.1007/3-540-48490-6
http://cds.cern.ch/record/1012802
work_keys_str_mv AT wissmannpeter electricalresistivityofthinmetalfilms
AT finzelhansulrich electricalresistivityofthinmetalfilms