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5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors
| Autor principal: | |
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| Lenguaje: | eng |
| Publicado: |
2007
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/1027871 |
| _version_ | 1780912306847219712 |
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| author | Seidel, Helmut |
| author_facet | Seidel, Helmut |
| author_sort | Seidel, Helmut |
| collection | CERN |
| id | cern-1027871 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 2007 |
| record_format | invenio |
| spelling | cern-10278712021-04-25T17:21:19Zhttp://cds.cern.ch/record/1027871engSeidel, Helmut5th International Workshop on Physical Chemistry of Wet Etching of SemiconductorsXXoai:cds.cern.ch:10278712007 |
| spellingShingle | XX Seidel, Helmut 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors |
| title | 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors |
| title_full | 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors |
| title_fullStr | 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors |
| title_full_unstemmed | 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors |
| title_short | 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors |
| title_sort | 5th international workshop on physical chemistry of wet etching of semiconductors |
| topic | XX |
| url | http://cds.cern.ch/record/1027871 |
| work_keys_str_mv | AT seidelhelmut 5thinternationalworkshoponphysicalchemistryofwetetchingofsemiconductors |